Surface transient effects in ultralow-energy O2+ sputtering of silicon

Surface and Interface Analysis

Volumn 37, Issue 7, 2005, Pages 628-632

  Chanbasha, A R ^a   Wee, A T S ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Secondary ion mass spectroscopy; Sputter rate; Surface transient; Ultralow energy

Indexed keywords

EROSION; ION BOMBARDMENT; OXIDATION; OXYGEN; POSITIVE IONS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; SILICA; SILICON ALLOYS; SPUTTERING; SURFACE ROUGHNESS; TRANSIENTS;

IMPACT ENERGY; SPUTTER RATES; SURFACE TRANSIENTS; ULTRALOW ENERGY;

SURFACE CHEMISTRY;

EID: 21544447548     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.2058     Document Type: Article

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