A loss mechanism study of a very high Q silicon micromechanical oscillator

Journal of Applied Physics

Volumn 97, Issue 2, 2005, Pages

  Liu, Xiao ^a   Vignola, J F ^a   Simpson, H J ^a   Lemon, B R ^a   Houston, B H ^a   Photiadis, D M ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MECHANICAL ENERGY; NANOELECTROMECHANICAL SYSTEMS (NEMS); SILICON MICROMECHANICAL OSCILLATORS; SURFACE ADSORBATES;

ANNEALING; COMPOSITE MICROMECHANICS; FRICTION; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; PHONONS; SCANNING; THERMOELASTICITY;

SILICON;

EID: 19944430419     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1819980     Document Type: Review

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