In situ atomic force microscopy observation of dissolution process of Si(111) in oxygen-free water at room temperature

Electrochemical and Solid-State Letters

Volumn 2, Issue 8, 1999, Pages 393-394

  Fukidome, Hirokazu ^a   Matsumura, Michio ^a   Komeda, Tadahiro ^b   Namba, Kenji ^c   Nishioka, Yasushiro ^c  

^a OSAKA UNIVERSITY   (Japan)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^c Texas Instruments Japan Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; FLOW OF WATER; OXYGEN; SILICON; WATER;

CHEMICAL DEOXYGENATOR; DISSOLVED OXYGEN;

DISSOLUTION;

EID: 0032637937     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390848     Document Type: Article

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