Preparation of flat H-Si(111) surfaces in 40% NH4F revisited

Electrochimica Acta

Volumn 45, Issue 28, 2000, Pages 4591-4598

  Allongue, Philippe ^a   Henry De Villeneuve, Catherine ^a   Morin, Sylvie ^b   Boukherroub, Rabah ^b   Wayner, Danial D M ^b  

^a CNRS   (France)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; CHEMICAL POLISHING; ELECTROCHEMISTRY; ETCHING; PITTING; SURFACE ROUGHNESS;

AMMONIUM FLUORIDE;

SILICON WAFERS;

EID: 0343832016     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(00)00610-1     Document Type: Article

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