Infrared reflection characteristics in InN thin films grown by magnetron sputtering for the application of plasma filters

Journal of Applied Physics

Volumn 92, Issue 7, 2002, Pages 3683-3687

  Qian, Z G ^a   Shen, W Z ^a   Ogawa, H ^b   Guo, Q X ^b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b SAGA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GAAS; GAINASSB; HEAVILY DOPED; INFRARED REFLECTIONS; INN THIN FILMS; IR REFLECTION; PLASMA FILTER; RADIO FREQUENCY MAGNETRON SPUTTERING; THERMOPHOTOVOLTAIC SYSTEMS; TRANSPARENT CONDUCTING OXIDE;

CARRIER CONCENTRATION; MAGNETRON SPUTTERING; PHOTOVOLTAIC CELLS; PLASMA OSCILLATIONS;

THIN FILMS;

EID: 18644374069     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1506199     Document Type: Article

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