Optical and electrical properties of InN thin films grown on ZnO/α-Al2O3 by RF reactive magnetron sputtering

Thin Solid Films

Volumn 334, Issue 1-2, 1998, Pages 49-53

  Ikuta, Kazuo ^a   Inoue, Yasushi ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Epitaxial growth; III V compound semiconductors; Nitride; Sputtering

Indexed keywords

ALUMINA; CARRIER CONCENTRATION; EPITAXIAL GROWTH; FILM GROWTH; MAGNETRON SPUTTERING; SEMICONDUCTING INDIUM COMPOUNDS; THIN FILMS; ZINC OXIDE;

VAN DER PAUW TECHNIQUE;

SEMICONDUCTING FILMS;

EID: 0032483888     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01115-8     Document Type: Article

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