Deposition of InN thin films by radio frequency magnetron sputtering

Journal of Crystal Growth

Volumn 189-190, Issue , 1998, Pages 466-470

  Guo, Qixin ^a   Shingai, Nobuhiro ^a   Nishio, Mitsuhiro ^a   Ogawa, Hiroshi ^a  

^a SAGA UNIVERSITY   (Japan)

Author keywords

Deposition; Glass substrate; InN; RF magnetron sputtering; Substrate temperature

Indexed keywords

CARRIER CONCENTRATION; GLASS; MAGNETRON SPUTTERING; SEMICONDUCTING INDIUM COMPOUNDS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS;

HALL MOBILITY; RADIO FREQUENCY MAGNETRON SPUTTERING;

SEMICONDUCTING FILMS;

EID: 0032094122     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(98)00332-7     Document Type: Article

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