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Volumn 343-344, Issue 1-2, 1999, Pages 524-527
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Effects of nitrogen/argon ratio on composition and structure of InN films prepared by r.f. magnetron sputtering
a
SAGA UNIVERSITY
(Japan)
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Author keywords
Composition; Crystal structure; Indium nitride; Nitrogen Argon ratio; Sputtering
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Indexed keywords
ARGON;
AUGER ELECTRON SPECTROSCOPY;
CRYSTAL STRUCTURE;
FILM GROWTH;
MAGNETRON SPUTTERING;
NITRIDES;
NITROGEN;
SEMICONDUCTING INDIUM COMPOUNDS;
X RAY CRYSTALLOGRAPHY;
INDIUM NITRIDE;
WURTZITE STRUCTURE;
SEMICONDUCTING FILMS;
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EID: 0032647174
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(98)01671-X Document Type: Article |
Times cited : (29)
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References (13)
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