Preferred orientation and film structure of TaN films deposited by reactive magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 2, 2004, Pages 332-338

  Noda, Suguru ^a   Tepsanongsuk, Kun ^a   Tsuji, Yoshiko ^a   Kajikawa, Yuya ^a   Ogawa, Yoshifumi ^a   Komiyama, Hiroshi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; DEPOSITION; ELECTROMIGRATION; FILM GROWTH; MAGNETRON SPUTTERING; METALLIC FILMS; NUCLEATION; POLYCRYSTALLINE MATERIALS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

FILM STRUCTURE; PREFERRED ORIENTATIONS (PO);

TANTALUM COMPOUNDS;

EID: 1842504039     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1647593     Document Type: Article

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