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Thin Solid Films

Volumn 413, Issue 1-2, 2002, Pages 46-51

Microstructural and electrical characteristics of reactively sputtered Ta-N thin films

(3) Chang, Ching Chun a Jeng, J S a Chen, Jen S a

a NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

Author keywords

Microstructure; Reactive sputtering; Resistivity; Tantalum nitride

Indexed keywords

AMORPHOUS MATERIALS; AUGER ELECTRON SPECTROSCOPY; CHARACTERIZATION; CHEMICAL BONDS; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; NITROGEN; SCANNING ELECTRON MICROSCOPY; TANTALUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTIVE SPUTTERING;

THIN FILMS;

EID: 0037166524 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00342-5 Document Type: Article

Times cited : (116)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.