Crystallographic and morphological characterization of reactively sputtered Ta, Ta-N and Ta-N-O thin films

Thin Solid Films

Volumn 307, Issue 1-2, 1997, Pages 79-88

  Stavrev, Momtchil ^a   Fischer, Dirk ^a   Wenzel, Christian ^a   Drescher, Kurt ^a   Mattern, Norbert ^b  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b IFW DRESDEN   (Germany)

Author keywords

Amorphous materials; Diffusion barrier; PVD; Tantalum

Indexed keywords

COMPOSITION EFFECTS; CRYSTAL ATOMIC STRUCTURE; DIFFUSION IN SOLIDS; FILM GROWTH; MAGNETRON SPUTTERING; MORPHOLOGY; SILICON; SPUTTER DEPOSITION; STOICHIOMETRY; TANTALUM COMPOUNDS; THIN FILMS;

BODY CENTERED CUBIC (BCC) STRUCTURE; DIFFUSION BARRIERS; FOUR POINT PROBE MEASUREMENTS; PHASE CENTERED CUBIC (FCC) STRUCTURE;

PROTECTIVE COATINGS;

EID: 0031250083     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00319-2     Document Type: Article

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