Investigations on non-stoichiometric zirconium nitrides

Applied Surface Science

Volumn 200, Issue 1-4, 2002, Pages 231-238

  Benia, H M ^a   Guemmaz, M ^a   Schmerber, G ^b   Mosser, A ^b   Parlebas, J C ^b  

^a FERHAT ABBAS UNIVERSITY   (Algeria)

^b INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

Author keywords

dc reactive sputtering; Reflectance; Resistivity; Zirconium nitrides

Indexed keywords

AMORPHOUS FILMS; CHARACTERIZATION; ELECTRIC CONDUCTIVITY; LIGHT REFLECTION; MAGNETRON SPUTTERING; NITROGEN; RATE CONSTANTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM COMPOUNDS;

NON-STOICHIOMETRIC FILMS; REFLECTOMETRY;

SURFACE STRUCTURE;

EID: 0037110948     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00925-X     Document Type: Article

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