Investigation of the hydrogenation properties of Zr films under unclean plasma conditions

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 6, 2002, Pages 1840-1845

  Shi, L Q ^a   Yan, G Q ^a   Zhou, J Y ^a   Luo, S Z ^b   Peng, S M ^b   Ding, W ^b   Long, X G ^b  

^a FUDAN UNIVERSITY   (China)

^b RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; CONTAMINATION; METALLIC FILMS; NICKEL; PLASMA APPLICATIONS; PRESSURE EFFECTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THERMAL EFFECTS; ZIRCONIUM;

ELASTIC RECOIL DETECTION ANALYSIS;

HYDROGENATION;

EID: 0036865187     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1506174     Document Type: Article

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