Nanoimprint- and UV-lithography: mix&match process for fabrication of interdigitated nanobiosensors

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 521-524

  Montelius, L ^a   Heidari, B ^a   Graczyk, M ^a   Maximov, I ^a   Sarwe, E L ^a   Ling, T G I ^a  

^a LUND UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

BIOSENSORS; ELECTRON BEAM LITHOGRAPHY; MASKS; MICROELECTRODES; MICROELECTRONIC PROCESSING; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; SPECTROSCOPY; ULTRAVIOLET RADIATION;

ADMITTANCE SPECTROSCOPY; INTERDIGITATED NANOBIOSENSORS; NANOIMPRINT LITHOGRAPHY; ULTRAVIOLET LITHOGRAPHY;

MICROSENSORS;

EID: 0034205554     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00369-5     Document Type: Article

References (6)

1. 1. See for e.g. Technology roadmap for nanoelectronics, Eds.: R Compano, L. Molenkamp and D.J. Paul. European Commission, IST Programme, MEL-ARI NANO, April 1999 http:/www.cordis.lu/esprit/src/melari.htm
2. 2. S. Y. Chou, P. R. Krauss, and P. J. Renstrom. Imprint of sub-25 nm vias and trenches in polymers. Appl. Phys. Lett. 67, 3114 (1995)
3. 3. L. Montelius, J. O. Tegenfeldt and T. G. I. Ling, Fabrication and characterization of a nanosensor for admittance spectroscopy of biomolecules, J. Vac. Sci. Techn. A 13, 1755 (1995)
4. 4. B. Heidari, I. Maximov, E-L. Sarwe and L. Montelius, Large scale nanolithography using nanoimprint lithography, accepted for publication in J. Vac. Sci. Techn. B Nov/Dec 1999.
5. 5. The NIL equipment described and used here will be commercialized, contact corresponding author for more information.
6. 6. To be published elsewhere.