Capacitively coupled plasma source operating in Xe/Ar mixtures

Journal of Physics D: Applied Physics

Volumn 38, Issue 2, 2005, Pages 287-299

  Babaeva, N Yu ^a,c   Lee, J K ^a   Shon, J W ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b LAM RESEARCH CORPORATION   (United States)

^c JOINT INSTITUTE FOR HIGH TEMPERATURES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CURRENT DENSITY; DATA ACQUISITION; ELECTRODES; MONTE CARLO METHODS; PHOTORESISTS; XENON;

CAPACITIVELY COUPLED PLASMA (CCP); ION ENERGY DISTRIBUTIONS (IED); SELF-ALIGNED CONTACT (SAC) STRUCTURES; XENON BUFFER GAS;

PLASMA SOURCES;

EID: 12844251303     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/2/014     Document Type: Conference Paper

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