Lecture notes on radio-frequency discharges, dc potentials, ion and electron energy distributions

Plasma Sources Science and Technology

Volumn 9, Issue 4, 2000, Pages 507-516

  Goedheer, W J ^a  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTOELECTRIC EFFECTS; DISSOCIATION; ELECTRIC POTENTIAL; ELECTRODES; ETCHING; KINETIC ENERGY; PLASMA COLLISION PROCESSES; SEMICONDUCTING FILMS; THIN FILMS;

ELECTRON ENERGY DISTRIBUTION; RADIO-FREQUENCY (RF) DISCHARGES;

ELECTRIC DISCHARGES;

EID: 0034322968     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/9/4/306     Document Type: Article

References (18)

1. Manos D M and Flamm D L (eds) 1988 Plasma Etching, An Introduction (San Diego, CA: Academic)
2. Bruno G, Capezzuto P and Madan A (eds) 1995 Plasma Deposition of Amorphous Silicon-Based Materials (San Diego, CA: Academic)
3. Williams P F (ed) 1997 Plasma Processing of Semiconductors (NATO ASI Series E: Applied Sciences vol 336) (Dordrecht: Kluwer)
4. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
5. van Roosmalen A J, Baggerman J A G and Brader S J H 1991 Dry Etching for VLSI (New York: Plenum)
6. Meijer P M and Goedheer W J 1991 IEEE Trans. Plasma Sci. 19 170-5
7. Goedheer W J, Meijer P M, Bezemer J, Passchier J D P and van Sark W G J H M 1995 IEEE Trans. Plasma Sci. 23 644-9
8. Rauf S and Kushner M J 1998 J. Appl. Phys. 83 5087-94
9. Benoit-Cattin P and Bernard L-C 1968 J. Appl. Phys. 39 5723-6
10. Wild C and Koidl P 1989 Appl. Phys. Lett. 54 505-7
11. Manenschijn A and Goedheer W J 1991 J. Appl. Phys. 69 2923-30
12. Manenschijn A, Janssen G C A M, van der Drift E and Radelaar S 1991 J. Appl. Phys. 69 1253-62
13. Winkler R, Wilhelm J and Hess A 1983 Beitr. Plasmaphys. 23 483-96
14. Winkler R, Capitelli M, Dilonardo M, Gorse C and Wilhelm J 1986 Plasma Chem. Plasma Proc. 6 437-56
15. Winkler R, Braglia G L and Wilhelm J 1989 Ann. Phys., Lpz. 46 21-40
16. Kaganovitch I D and Tsendin L D 1992 IEEE Trans. Plasma Sci. 20 66-75
17. Godyak V A, Piejak R B and Alexandrovich B M 1992 Phys. Rev. Lett. 68 40-3
18. Raizer Y P, Shneider M N and Yatsenko N A 1995 Radio-Frequency Capacitive Discharges (Boca Raton, FL: CRC Press)