Discharge asymmetry induced by the pulsed radio-frequency current

Applied Physics Letters

Volumn 84, Issue 6, 2004, Pages 864-866

  Kim, H C ^a   Lee, J K ^a   Shon, J W ^a,b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVELY COUPLED PLASMAS; DISCHARGE ASYMMETRY; PULSED RADIOFREQUENCY;

COMPUTER SIMULATION; ION BOMBARDMENT; MONTE CARLO METHODS; PLASMA DENSITY;

PLASMA SOURCES;

EID: 1542285018     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1646458     Document Type: Article

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