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Volumn 63, Issue 24, 2001, Pages

Atomic and ionic processes of silicon oxidation

Author keywords

[No Author keywords available]

Indexed keywords

SILICON;

EID: 0034899494     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.63.241304     Document Type: Article
Times cited : (79)

References (30)
  • 4
    • 0034503799 scopus 로고    scopus 로고
    • Materials Research Society, and, in, edited by D. A. Buchanan, A. H. Edwards, H. J. Bardeleben, and T. Hattori, Pittsburgh, p
    • T. Hattori, H. Nohira, Y. Teramoto, and N. Watanabe, in Structure and Electronic Properties of Ultra Thin Dielectric Films on Silicon and Related Structures, edited by D. A. Buchanan, A. H. Edwards, H. J. Bardeleben, and T. Hattori, Materials Research Soc. Symposum Proc.592 (Materials Research Society, Pittsburgh, 2000), p. 33.
    • (2000) Materials Research Soc. Symposum Proc. , vol.592 , pp. 33
    • Hattori, T.1    Nohira, H.2    Teramoto, Y.3    Watanabe, N.4
  • 8
    • 0034500551 scopus 로고    scopus 로고
    • in, Ref., p. 3)
    • A M. Stoneham, M A. Szymanski, and A L. Shluger, in Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures, MRS Symp. Proc.592, 3 (2000) (Ref. 4, p. 3).
    • (2000) MRS Symp. Proc. , vol.592 , pp. 3
    • Stoneham, A.M.1    Szymanski, M.A.2    Shluger, A.L.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.