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Volumn 10, Issue 5, 1998, Pages 995-1002
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First-principles study of the self-interstitial diffusion mechanism in silicon
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0000659110
PISSN: 09538984
EISSN: None
Source Type: Journal
DOI: 10.1088/0953-8984/10/5/009 Document Type: Article |
Times cited : (53)
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References (23)
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