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Volumn 258, Issue 3-4, 2003, Pages 318-330

Thermal system design and dislocation reduction for growth of wide band gap crystals: Application to SiC growth

Author keywords

A1. Defects; A1. Growth models; A1. Stresses; A2. Growth from vapor

Indexed keywords

COMPUTER SIMULATION; CRYSTAL DEFECTS; DISLOCATIONS (CRYSTALS); ENERGY GAP; INTERFACES (MATERIALS); MATHEMATICAL MODELS; POLYCRYSTALLINE MATERIALS; SILICON CARBIDE; STRESS ANALYSIS; THERMAL EFFECTS; THERMOELASTICITY;

EID: 0141843598     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(03)01540-9     Document Type: Article
Times cited : (40)

References (26)
  • 18
    • 7644236367 scopus 로고    scopus 로고
    • Silicon Carbide Crystals - Art I: Growth and characterization
    • K. Byrappa, & T. Ohachi. Southampton, UK: WIT Press
    • Dhanaraj G., Huang X.R., Dudley M., Prasad V., Ma R.-H. Silicon Carbide Crystals - part I. growth and characterization Byrappa K., Ohachi T. Crystal Growth for Modern Technology. 2003;181 WIT Press, Southampton, UK.
    • (2003) Crystal Growth for Modern Technology , pp. 181
    • Dhanaraj, G.1    Huang, X.R.2    Dudley, M.3    Prasad, V.4    Ma, R.-H.5
  • 24
    • 0141747345 scopus 로고    scopus 로고
    • Ph. D. Dissertation, State University of New York at Stony Brook
    • R.-H. Ma, Ph. D. Dissertation, State University of New York at Stony Brook, 2003, p. 78.
    • (2003) , pp. 78
    • Ma, R.-H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.