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Volumn 252, Issue 4, 2003, Pages 523-537

Integrated process modeling and experimental validation of silicon carbide sublimation growth

Author keywords

A1. Growth models; A1. Line defects; A1. Mass transfer; A1. Stresses; A3. Growth from vapor

Indexed keywords

CRYSTAL GROWTH; HEAT TRANSFER; INTERFACES (MATERIALS); MASS TRANSFER; SUBLIMATION; THERMAL STRESS;

EID: 0037403942     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(03)00944-8     Document Type: Article
Times cited : (66)

References (26)
  • 18
    • 0000626886 scopus 로고    scopus 로고
    • NIST-JANAF thermochemical tables, 4th edition
    • American Chemical Society and American Institute of Physics
    • D.W. Chase Jr., NIST-JANAF Thermochemical Tables, 4th Edition, American Chemical Society and American Institute of Physics, J. Phys. Chem. Ref. Data, Monograph No. 9, 1998.
    • (1998) J. Phys. Chem. Ref. Data, Monograph , vol.9
    • Chase D.W., Jr.1
  • 19
    • 0001066781 scopus 로고
    • Bulk crystal growth by physical vapor transport
    • Hurle D.I.J. (Ed.), Amsterdam: Elsevier Science
    • Kaldis E., Piechotka E.M. Bulk crystal growth by physical vapor transport. Hurle D.I.J. Handbook of Crystal Growth. Vol. 2:1994;615 Elsevier Science, Amsterdam.
    • (1994) Handbook of Crystal Growth , vol.2 , pp. 615
    • Kaldis, E.1    Piechotka, E.M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.