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Volumn 226, Issue 4, 2001, Pages 501-510

Global modeling of the SiC sublimation growth process: Prediction of thermoelastic stress and control of growth conditions

Author keywords

A1. Computer simulation; A1. Heat transfer; A1. Stress; A2. Single crystal growth; A3. Physical vapor deposition processes; B1. Silicon carbide

Indexed keywords

COMPUTER SIMULATION; CRYSTAL GROWTH; DISLOCATIONS (CRYSTALS); HEAT TRANSFER; MASS TRANSFER; MATHEMATICAL MODELS; PHYSICAL VAPOR DEPOSITION; SINGLE CRYSTALS; SUBLIMATION; THERMAL STRESS; THERMOELASTICITY;

EID: 0035427048     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01401-4     Document Type: Article
Times cited : (47)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.