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Volumn 2, Issue 3, 2002, Pages 213-220

Growth Kinetics and Thermal Stress in the Sublimation Growth of Silicon Carbide

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000741328     PISSN: 15287483     EISSN: None     Source Type: Journal    
DOI: 10.1021/cg015572p     Document Type: Article
Times cited : (68)

References (19)
  • 1
    • 0007688187 scopus 로고    scopus 로고
    • Silicon Carbide Crystals - Part I: Growth and Characterization
    • Byrappa, K., Ohachi, T., Eds.; WIT Press: Southampton, UK
    • Dhanaraj, G.; Huang, X. R.; Dudley, M.; Prasad, V.; Ma, R.-H., "Silicon Carbide Crystals - Part I: Growth and Characterization", In Crystal Growth for Modern Technology; Byrappa, K., Ohachi, T., Eds.; WIT Press: Southampton, UK, 2001.
    • (2001) Crystal Growth for Modern Technology
    • Dhanaraj, G.1    Huang, X.R.2    Dudley, M.3    Prasad, V.4    Ma, R.-H.5
  • 2
    • 0007704044 scopus 로고    scopus 로고
    • Silicon Carbide Crystals - Part II: Process Physics and Modeling
    • Byrappa, K., Ohachi, T., Eds.; WIT Press: Southampton, UK
    • Chen, Q.-S.; Prasad, V.; Zhang, H.; Dudley, M. "Silicon Carbide Crystals - Part II: Process Physics and Modeling", In Crystal Growth for Modern Technology; Byrappa, K., Ohachi, T., Eds.; WIT Press: Southampton, UK, 2001.
    • (2001) Crystal Growth for Modern Technology
    • Chen, Q.-S.1    Prasad, V.2    Zhang, H.3    Dudley, M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.