-
2
-
-
0026102250
-
-
H. SUEMATSU, T. SUZUKI, T. ISEKI, and T. MORI, J. Amer. Ceram. Soc. 74, 173 (1991).
-
(1991)
J. Amer. Ceram. Soc.
, vol.74
, pp. 173
-
-
Suematsu, H.1
Suzuki, T.2
Iseki, T.3
Mori, T.4
-
3
-
-
0001705518
-
Stress-Induced Polytypic Transformation in SiC
-
Eds. T. D. MOUSTAKAS, J. I. PANKOVE, and Y. HAMAKAWA, Materials Research Society, Pittsburgh, PA
-
J. W. YANG, T. SUZUKI, P. PIROUZ, J. A. POWELL, and T. ISEKI, Stress-Induced Polytypic Transformation in SiC, in: Wide Band Gap Semiconductors, Eds. T. D. MOUSTAKAS, J. I. PANKOVE, and Y. HAMAKAWA, Materials Research Society, Pittsburgh, PA 1992 (pp. 531 to 536).
-
(1992)
Wide Band Gap Semiconductors
, pp. 531-536
-
-
Yang, J.W.1
Suzuki, T.2
Pirouz, P.3
Powell, J.A.4
Iseki, T.5
-
5
-
-
85034301354
-
Kink and Crack Interfaces in Low-Temperature-Deformed 6H-SiC Single Crystals
-
Eds. D. A. BONNELL, U. CHOWDHRY, and M. RÜHLE, Materials Research Society, Pittsburgh, PA
-
X. J. NING and P. PIROUZ, Kink and Crack Interfaces in Low-Temperature-Deformed 6H-SiC Single Crystals, in: Structure and Properties of Interfaces in Ceramics, Eds. D. A. BONNELL, U. CHOWDHRY, and M. RÜHLE, Materials Research Society, Pittsburgh, PA 1994 (pp. 157 to 162).
-
(1994)
Structure and Properties of Interfaces in Ceramics
, pp. 157-162
-
-
Ning, X.J.1
Pirouz, P.2
-
6
-
-
0000480697
-
-
D. FELDMAN, J. PARKER, W. CHOYKE, and L. PATRICK, Phys. Rev. A 170, 698 (1986).
-
(1986)
Phys. Rev. A
, vol.170
, pp. 698
-
-
Feldman, D.1
Parker, J.2
Choyke, W.3
Patrick, L.4
-
7
-
-
0001061004
-
-
S. NAKASHIMA, H. KATAHAMA, Y. NAKAKURA, and A. MITSUISHI, Phys. Rev. B 33, 5721 (1986).
-
(1986)
Phys. Rev. B
, vol.33
, pp. 5721
-
-
Nakashima, S.1
Katahama, H.2
Nakakura, Y.3
Mitsuishi, A.4
-
9
-
-
0029386513
-
-
Z. FENG, C. TIN, R. Hu, and K. YUE, Semicond. Sci. Technol. 10, 1418 (1995).
-
(1995)
Semicond. Sci. Technol.
, vol.10
, pp. 1418
-
-
Feng, Z.1
Tin, C.2
Hu, R.3
Yue, K.4
-
10
-
-
0001707834
-
Standard Recommended Practice for Photographic Photometry in Spetrochemical Analysis
-
Modified ASTM Standard E116, American Society for Testing and Materials, Philadelphia, PA
-
Standard Recommended Practice for Photographic Photometry in Spetrochemical Analysis, Modified ASTM Standard E116, in: Ann. Book of ASTM Standards, American Society for Testing and Materials, Philadelphia, PA 1996.
-
(1996)
Ann. Book of ASTM Standards
-
-
-
11
-
-
0348151965
-
Thermal Expansion and Elastic Anisotropies of SiC as Related to Polytype Structure
-
The American Ceramic Society, Inc., Westerville, OH
-
Z. LI and R. C. BRADT, Thermal Expansion and Elastic Anisotropies of SiC as Related to Polytype Structure, in: Ceramic Transactions: Silicon Carbide '87, The American Ceramic Society, Inc., Westerville, OH 1989 (p. 313 to 339).
-
(1989)
Ceramic Transactions: Silicon Carbide '87
, pp. 313-339
-
-
Li, Z.1
Bradt, R.C.2
-
15
-
-
0023349675
-
-
M. OMRI, C. TETE, J.-P. MICHEL, and A. GEORGE, Phil. Mag. A55, 601 (1987).
-
(1987)
Phil. Mag.
, vol.A55
, pp. 601
-
-
Omri, M.1
Tete, C.2
Michel, J.-P.3
George, A.4
-
16
-
-
0003674593
-
-
Ed. B. CHALMERS, J. W. CHRISTIAN, and T. B. MASSALSKI, Pergamon Press, Oxford
-
U. F. KOCKS, A. S. ARGON, and M. F. ASHBY, in: Progress in Materials Science, Vol. 19, Ed. B. CHALMERS, J. W. CHRISTIAN, and T. B. MASSALSKI, Pergamon Press, Oxford 1975.
-
(1975)
Progress in Materials Science
, vol.19
-
-
Kocks, U.F.1
Argon, A.S.2
Ashby, M.F.3
-
21
-
-
0002032898
-
Partial Dislocations in Semiconductors: Structure, Properties and Their Role in Strain Relaxation
-
Microscopy of Semiconducting Materials, Bristol
-
P. PIROUZ and X. J. NING, Partial Dislocations in Semiconductors: Structure, Properties and Their Role in Strain Relaxation, in: Microscopy of Semiconducting Materials, Inst. Phys. Conf. Ser., Vol. 146, Bristol 1995 (pp. 69 to 77).
-
(1995)
Inst. Phys. Conf. Ser.
, vol.146
, pp. 69-77
-
-
Pirouz, P.1
Ning, X.J.2
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