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Macromolecular Materials and Engineering

Volumn 288, Issue 5, 2003, Pages 455-461

Synthesis of poly(methyl-co-trifluoropropyl)-silsesquioxanes and their thin films for low dielectric application

(5) Hyeon Lee, Jingyu a Kim, Woon Chun b Min, Sung Kyu c Ree, Hee Woo c Yoon, Do Y b

a Samsung Advanced Institute of Technology (SAIT) (South Korea)

b Seoul National University (South Korea)

c Sogang University (South Korea)

Author keywords

Copolymers; Dielectric properties; Mechanical properties; Polysilsesquioxanes

Indexed keywords

CATALYSTS; MICROSTRUCTURE; MOLECULAR WEIGHT; PERMITTIVITY; REFRACTIVE INDEX; SYNTHESIS (CHEMICAL); THIN FILMS;

MOLAR RATIO;

ORGANIC POLYMERS;

COPOLYMER; METHYLTRIMETHOXYSILANE; POLY(METHYL CO TRIFLUOROPROPYL)SILSESQUIOXANE; POLYMER; SILANE DERIVATIVE; TRIFLUOROPROPYLTRIMETHOXYSILANE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL STRUCTURE; CRYSTAL STRUCTURE; DIELECTRIC CONSTANT; ELASTICITY; FILM; MECHANICAL STRESS; MOLECULAR WEIGHT; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; POLYMERIZATION; REFRACTION INDEX; SYNTHESIS; TEMPERATURE DEPENDENCE; THERMAL ANALYSIS; THERMOGRAVIMETRY; YOUNG MODULUS;

EID: 0037568288 PISSN: 14387492 EISSN: None Source Type: Journal
DOI: 10.1002/mame.200390042 Document Type: Article

Times cited : (27)

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