Methylsiloxane spin-on-glass films for low dielectric constant interlayer dielectrics

Journal of the Electrochemical Society

Volumn 147, Issue 4, 2000, Pages 1477-1480

  Yamada, Noriko ^a   Takahashi, Toru ^a,b  

^a NIPPON STEEL CORPORATION   (Japan)

^b Japan Institute of Invention and Innovation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURING; DECOMPOSITION; HYDROLYSIS; HYDROPHOBICITY; NITROGEN; ORGANIC COMPOUNDS; PERMITTIVITY; PYROLYSIS; SURFACES;

BRUNAUER-EMMETT-TELLER SURFACE AREA; DIMETHOXYMETHYL TRIFLUOROPROPYLSILANE; METHYLSILOXANE; METHYLTRIETHOXYSILANE; SPIN ON GLASS SOLUTION;

SOLUTIONS;

EID: 0033734220     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393381     Document Type: Article

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