Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering

Thin Solid Films

Volumn 386, Issue 1, 2001, Pages 105-110

  Lee, Ching Ting ^a   Yu, Qing Xuan ^b   Tang, Bang Tai ^a   Lee, Hsin Ying ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS; INDIUM COMPOUNDS; OPTICAL FILMS; PLASMA APPLICATIONS; SPUTTER DEPOSITION; SUBSTRATES;

INDIUM TIN OXIDE (ITO) FILMS; REACTIVE SPUTTERING;

CONDUCTIVE FILMS;

EID: 0035341641     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)00777-5     Document Type: Article

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