Effects of oxygen radical on the properties of indium tin oxide thin films deposited at room temperature by oxygen ion beam assisted evaporation

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 103-108

  Kim, J S ^a   Bae, J W ^a   Kim, H J ^a   Lee, N E ^a   Yeom, G Y ^a   Oh, K H ^b  

^a Sungkyunkwan University   (South Korea)

^b Agency for Technology and Standards   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; DEPOSITION; EVAPORATION; INDIUM COMPOUNDS; IRRADIATION; POLYCARBONATES; SUBSTRATES;

OXYGEN ION BEAM ASSISTED EVAPORATION;

THIN FILMS;

EID: 0034509122     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01392-4     Document Type: Article

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