Electrical and structural properties of indium tin oxide films prepared by pulsed laser deposition

Journal of Applied Physics

Volumn 91, Issue 3, 2002, Pages 1213-1218

  Izumi, Hirokazu ^a   Adurodija, Frederick O ^a   Kaneyoshi, Takahiro ^a   Ishihara, Tsuguo ^a   Yoshioka, Hideki ^a   Motoyama, Muneyuki ^a  

^a Hyogo Prefectural Institute of Industrial Research Technical Center for Machinery and Metals   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL AND STRUCTURAL PROPERTIES; GRAZING INCIDENCE; GRAZING INCIDENCE X-RAY DIFFRACTION; HIGH CRYSTALLINITY; IN-SITU; INDIUM TIN OXIDE FILMS; ITO FILMS; LOW RESISTIVITY; OXYGEN PRESSURE; SUBSTRATE TEMPERATURE;

ELECTRIC PROPERTIES; FILM GROWTH; INDIUM COMPOUNDS; OXIDE FILMS; PULSED LASER DEPOSITION; RESIDUAL STRESSES; TIN; TIN OXIDES; X RAY DIFFRACTION;

FILM PREPARATION;

EID: 0036469362     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1427137     Document Type: Article

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