A comparative study of the interfacial roughness correlation and propagation in Mo/Si multilayers deposited using RF-magnetron sputtering on silicon, ule and zerodur substrates

Journal of Physics Condensed Matter

Volumn 14, Issue 39, 2002, Pages 8955-8968

  Putero Vuaroqueaux, Magali ^a   Faïk, Hasnaa ^a   Vidal, Bernard ^a  

^a AIX MARSEILLE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; LITHOGRAPHY; MAGNETRON SPUTTERING; MOLYBDENUM; OSCILLATIONS; SILICON; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; X RAY SCATTERING;

INTERFACIAL ROUGHNESS;

MULTILAYERS;

EID: 0037037810     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/14/39/305     Document Type: Article

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