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Volumn 312, Issue 1-2, 1998, Pages 320-326

Optical emission spectroscopy study of a radio-frequency magnetron discharge used for the fabrication of X-ray multilayer mirror

Author keywords

Magnetron; Optical emission; Sputtering; X ray

Indexed keywords

ARGON; EMISSION SPECTROSCOPY; LIGHT EMISSION; MAGNETRON SPUTTERING; MIRRORS; MULTILAYERS; PRESSURE EFFECTS; TUNGSTEN; X RAY APPARATUS;

EID: 0031704196     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00417-3     Document Type: Article
Times cited : (11)

References (17)
  • 1
    • 85075250438 scopus 로고    scopus 로고
    • Magnetron sputtering deposition of ultrathin W-Si multilayers for X-ray optics
    • Thin Films Technologies III
    • B. Vidal, J. Marfaing, P. Dhez, Magnetron sputtering deposition of ultrathin W-Si Multilayers for X-ray optics, SPIE Proceedings, Vol. 1019, Thin Films Technologies III, pp. 148-153.
    • SPIE Proceedings , vol.1019 , pp. 148-153
    • Vidal, B.1    Marfaing, J.2    Dhez, P.3
  • 7
    • 0042801057 scopus 로고
    • L.I. Maissel, R. Glang (Eds.), Chap. 4, McGraw-Hill, New York
    • L.I. Maussel, in: L.I. Maissel, R. Glang (Eds.), Handbook of Thin Film Technology, Chap. 4, McGraw-Hill, New York, 1970.
    • (1970) Handbook of Thin Film Technology
    • Maussel, L.I.1
  • 8
    • 0041798795 scopus 로고    scopus 로고
    • PhD Report, Chap. II, Universite d Aix-Marseille III
    • A. Yakshin, PhD Report, Chap. II, Universite d Aix-Marseille III, 1996.
    • (1996)
    • Yakshin, A.1
  • 15
    • 0041298266 scopus 로고
    • L.I. Maissel, R. Glang (Eds.), Chap. 4, McGraw-Hill, New York
    • L.I. Maissel, in: L.I. Maissel, R. Glang (Eds.), Handbook of Thin Film Technology, Chap. 4, McGraw-Hill, New York, 1970.
    • (1970) Handbook of Thin Film Technology
    • Maissel, L.I.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.