Automated set-up for extreme ultraviolet mask lithography: The first step to count and clean in one

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 627-638

  Hue, J ^a   Muffato, V ^a   Pelle C ^a   Quesnel, E ^a   Garrec, P ^a   Baume, F ^a  

^a CEA LETI   (France)

Author keywords

Blank; Defect; Extreme UltraViolet Lithography; Laser Cleaning; Light Scattering; Mask; Mirror

Indexed keywords

LASER APPLICATIONS; LIGHT SCATTERING; MASKS; MIRRORS; SURFACE CLEANING; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0034763493     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436718     Document Type: Conference Paper

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