EUV optical design for a 100 nm CD imaging system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 2-10

  Sweeney, Donald W ^a   Hudyma, Russ ^a   Chapman, Henry N ^a   Shafer, David ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Aspheric optics; EUV projection lithography; Multilayer coatings; Optical design

Indexed keywords

CAMERAS; LITHOGRAPHY; OPTICAL COATINGS; OPTICAL DESIGN; OPTICAL MULTILAYERS; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); OPTICAL SURFACES;

IMAGING SYSTEMS;

EID: 0032402532     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309559     Document Type: Conference Paper

References (5)

1. Diffraction methods raise interferometer accuracy