-
2
-
-
0000130079
-
Extreme ultraviolet lithography
-
C. W. Gwyn, R. Stulen, D. Sweeney, and D. Attwood, “Extreme ultraviolet lithography,” J. Vac. Sci. Technol. B 16, 3142-3149 (1998).
-
(1998)
J. Vac. Sci. Technol.
, vol.B16
, pp. 3142-3149
-
-
Gwyn, C.W.1
Stulen, R.2
Sweeney, D.3
Attwood, D.4
-
3
-
-
85010104019
-
-
Inc., Austin, Texas 94550 (personal communication
-
S. Hector, Advanced Products and Research Development Laboratory, Motorola, Inc., Austin, Texas 94550 (personal communication, 1999).
-
(1999)
Advanced Products and Research Development Laboratory, Motorola
-
-
Hector, S.1
-
4
-
-
0032402999
-
The fabrication and testing of optics for EUV projection lithography
-
Y. Vladirmirsky, ed., Proc. SPIE 3331
-
J. S. Taylor, G. E. Sommargren, D. W. Sweeney, and R. M. Hudyma, “The fabrication and testing of optics for EUV projection lithography,” in Emerging Lithographic Technologies II, Y. Vladirmirsky, ed., Proc. SPIE 3331, 580-590 (1998).
-
(1998)
Emerging Lithographic Technologies II
, pp. 580-590
-
-
Taylor, J.S.1
Sommargren, G.E.2
Sweeney, D.W.3
Hudyma, R.M.4
-
5
-
-
0032624672
-
Advances in multilayer reflective coatings for extreme ultraviolet lithography
-
Y. Vladirmirsky, ed., Proc. SPIE 3676
-
J. A. Folta, S. Bajt, T. W. Barbee, R. F. Grabner, P. B. Mirka-rimi, T. Nguyen, M. A. Schmidt, E. Spiller, C. C. Walton, M. Wedowski, and C. Montcalm, “Advances in multilayer reflective coatings for extreme ultraviolet lithography,” in Emerging Lithographic Technologies III, Y. Vladirmirsky, ed., Proc. SPIE 3676, 702-709 (1999).
-
(1999)
Emerging Lithographic Technologies III
, pp. 702-709
-
-
Folta, J.A.1
Bajt, S.2
Barbee, T.W.3
Grabner, R.F.4
Mirka-Rimi, P.B.5
Nguyen, T.6
Schmidt, M.A.7
Spiller, E.8
Walton, C.C.9
Wedowski, M.10
Montcalm, C.11
-
6
-
-
0032403818
-
Multilayer reflective coatings for extreme ultraviolet lithography
-
Y. Vladirmirsky, ed., Proc. SPIE 3331
-
C. Montcalm, S. Bajt, P. B. Mirkarimi, E. Spiller, F. J. Weber, and J. A. Folta, “Multilayer reflective coatings for extreme ultraviolet lithography,” in Emerging Lithographic Technologies II, Y. Vladirmirsky, ed., Proc. SPIE 3331, 42-51 (1998).
-
(1998)
Emerging Lithographic Technologies II
, pp. 42-51
-
-
Montcalm, C.1
Bajt, S.2
Mirkarimi, P.B.3
Spiller, E.4
Weber, F.J.5
Folta, J.A.6
-
7
-
-
0346659062
-
Multilayer x-ray mirrors: Interfacial roughness, scattering, and image quail ty
-
E. Spiller, D. Stearns, and M. Krumrey, “Multilayer x-ray mirrors: interfacial roughness, scattering, and image quail ty,” J. Appl. Phys. 74, 107-118 (1993).
-
(1993)
J. Appl. Phys.
, vol.74
, pp. 107-118
-
-
Spiller, E.1
Stearns, D.2
Krumrey, M.3
-
8
-
-
0027795351
-
Multilayer mirror technology for soft-x-ray projection lithography
-
D. G. Stearns, R. S. Rosen, and S. P. Vernon, “Multilayer mirror technology for soft-x-ray projection lithography,” Appl. Opt. 32, 6952-6960 (1993).
-
(1993)
Appl. Opt.
, vol.32
, pp. 6952-6960
-
-
Stearns, D.G.1
Rosen, R.S.2
Vernon, S.P.3
-
9
-
-
0028421881
-
Surface finish requirements for soft-x-ray mirrors
-
D. L. Windt, W. K. Waskiewicz, and J. E. Griffith, “Surface finish requirements for soft-x-ray mirrors,” Appl. Opt. 33, 2025-2031 (1994).
-
(1994)
Appl. Opt.
, vol.33
, pp. 2025-2031
-
-
Windt, D.L.1
Waskiewicz, W.K.2
Griffith, J.E.3
-
10
-
-
56249127529
-
Nonspecular scattering in a multilayer-coated imaging system
-
D. G. Stearns, D. P. Gaines, D. W. Sweeney, and E. M. Gul-likson, “Nonspecular scattering in a multilayer-coated imaging system,” J. Appl. Phys. 84, 1003-1028 (1998).
-
(1998)
J. Appl. Phys.
, vol.84
, pp. 1003-1028
-
-
Stearns, D.G.1
Gaines, D.P.2
Sweeney, D.W.3
Gul-Likson, E.M.4
-
11
-
-
85010118624
-
Scattering from normal incidence EUV optics
-
Y. Vladirmir-sky, ed., Proc. SPIE 3676
-
E. M. Gullikson, “Scattering from normal incidence EUV optics,” in Emerging Lithographic Technologies III, Y. Vladirmir-sky, ed., Proc. SPIE 3676, 72-80 (1999).
-
(1999)
Emerging Lithographic Technologies III
, pp. 72-80
-
-
Gullikson, E.M.1
-
12
-
-
0001662271
-
Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme ultraviolet lithography
-
P. B. Mirkarimi, S. Bajt, and M. Wall, “Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme ultraviolet lithography,” Appl. Opt. 39, 1617-1625 (2000).
-
(2000)
Appl. Opt.
, vol.39
, pp. 1617-1625
-
-
Mirkarimi, P.B.1
Bajt, S.2
Wall, M.3
-
14
-
-
5244231664
-
Mechanical properties of SiO2 vs. SiO2-TiO2 bulk glasses and fibers
-
M. M. Broer, G. H. Siegel, R. T. Kersten, and H. Kawazoe, eds. (Materials Research Society, Pittsburgh, Pa
-
2 bulk glasses and fibers,” in Optical Waveguide Materials, M. M. Broer, G. H. Siegel, R. T. Kersten, and H. Kawazoe, eds. (Materials Research Society, Pittsburgh, Pa., 1992), Vol. 244, pp. 67-84.
-
(1992)
Optical Waveguide Materials
, vol.244
, pp. 67-84
-
-
Gulati, S.T.1
-
15
-
-
85075860966
-
Repair of high performance multilayer coatings
-
N. M. Ceglio, ed., Proc. SPIE 1547
-
D. P. Gaines, N. M. Ceglio, S. P. Vernon, M. Krumrey, and P. Muller, “Repair of high performance multilayer coatings,” in Multilayer Optics for Advanced X-Ray Applications, N. M. Ceglio, ed., Proc. SPIE 1547, 228-238 (1991).
-
(1991)
Multilayer Optics for Advanced X-Ray Applications
, pp. 228-238
-
-
Gaines, D.P.1
Ceglio, N.M.2
Vernon, S.P.3
Krumrey, M.4
Muller, P.5
-
16
-
-
0038644391
-
Repair of soft x-ray optical elements by stripping and redeposition of Mo/Si reflective coatings
-
K. Early, D. L. Windt, W. K. Waskiewicz, O. R. Wood II, and D. M. Tennant, “Repair of soft x-ray optical elements by stripping and redeposition of Mo/Si reflective coatings,” J. Vac. Sci. Technol. B 11, 2926-2929 (1993).
-
(1993)
J. Vac. Sci. Technol.
, vol.B11
, pp. 2926-2929
-
-
Early, K.1
Windt, D.L.2
Waskiewicz, W.K.3
Wood, O.R.4
Tennant, D.M.5
-
17
-
-
85010118627
-
-
A. H. Hawryluk and R. H. Stulen, eds., Vol., of OSA Proceedings Series (Optical Society of America, Washington, D.C
-
D. G. Stearns and S. L. Baker, “Substrate recovery of Mo-Si multilayer coated optics,” in Soft X-Ray Projection Lithography, A. H. Hawryluk and R. H. Stulen, eds., Vol. 18 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1993), pp. 176-181.
-
(1993)
Substrate Recovery of Mo-Si Multilayer Coated Optics, in Soft X-Ray Projection Lithography
, vol.18
, pp. 176-181
-
-
Stearns, D.G.1
Baker, S.L.2
-
18
-
-
0038305455
-
Recovery of EUV lithography substrates
-
D. T. Atwood and F. Zernike, eds., of OSA Proceedings Series (Optical Society of America, Washington, D.C
-
S. P. Vernon and S. L. Baker, “Recovery of EUV lithography substrates,” in Extreme Ultraviolet Lithography, D. T. Atwood and F. Zernike, eds., Vol. 23 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1995), pp. 222-226.
-
(1995)
Extreme Ultraviolet Lithography
, vol.23
, pp. 222-226
-
-
Vernon, S.P.1
Baker, S.L.2
-
19
-
-
0033361671
-
Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography
-
C. A. MacDonald, K. A. Goldberg, J. R. Maldando, H. H. Chen-Mayer, and S. P. Vernon, eds., Proc. SPIE 3767
-
S. Bajt, R. D. Behymer, P. B. Mirkarimi, C. Montcalm, M. A. Wall, M. Wedowski, and J. A. Folta, “Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography,” in EUV, X-Ray, and Neutron Optics and Sources, C. A. MacDonald, K. A. Goldberg, J. R. Maldando, H. H. Chen-Mayer, and S. P. Vernon, eds., Proc. SPIE 3767, 259-270 (1999).
-
(1999)
EUV, X-Ray, and Neutron Optics and Sources
, pp. 259-270
-
-
Bajt, S.1
Behymer, R.D.2
Mirkarimi, P.B.3
Montcalm, C.4
Wall, M.A.5
Wedowski, M.6
Folta, J.A.7
-
20
-
-
0032665978
-
Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography
-
P. B. Mirkarimi, “Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography,” Opt. Eng. 38, 1246-1259 (1999).
-
(1999)
Opt. Eng.
, vol.38
, pp. 1246-1259
-
-
Mirkarimi, P.B.1
-
21
-
-
84953675274
-
Fabrication of high-reflectance Mo-Si multilayer mirrors by planarmagnetron sputtering
-
D. G. Stearns, R. S. Rosen, and S. P. Vernon, “Fabrication of high-reflectance Mo-Si multilayer mirrors by planarmagnetron sputtering,” J. Vac. Sci. Technol. A 9, 2662-2669 (1991).
-
(1991)
J. Vac. Sci. Technol. A
, vol.9
, pp. 2662-2669
-
-
Stearns, D.G.1
Rosen, R.S.2
Vernon, S.P.3
-
22
-
-
85010123080
-
Calibration and standards beamline 6.3.2 at the advanced light source
-
available on CD-ROM and at the following URL
-
J. H. Underwood, E. M. Gullikson, M. Koike, P. J. Batson, P. E. Denham, K. D. Franck, R. E. Tackaberry, and W. F. Steele, “Calibration and standards beamline 6.3.2 at the advanced light source,” in Proceedings of the National Conference on Synchrotron Radiation Instrumentation, Rev. Sci. Instrum. 67 (1996) (available on CD-ROM and at the following URL: http://www-cxro.lbl.gov/metrology/als6.3.2/pubs.html).
-
(1996)
Proceedings of the National Conference on Synchrotron Radiation Instrumentation, Rev. Sci. Instrum
, pp. 67
-
-
Underwood, J.H.1
Gullikson, E.M.2
Koike, M.3
Batson, P.J.4
Denham, P.E.5
Franck, K.D.6
Tackaberry, R.E.7
Steele, W.F.8
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