메뉴 건너뛰기




Volumn 40, Issue 1, 2001, Pages 62-70

Recovery of multilayer-coated zerodur and ule optics for extreme-ultraviolet lithography by recoating, reactive-ion etching, and wet-chemical processes

Author keywords

[No Author keywords available]

Indexed keywords

CORROSION; MULTILAYERS; REACTIVE ION ETCHING; SILICON; ULTRAVIOLET RADIATION;

EID: 0011066241     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.40.000062     Document Type: Article
Times cited : (12)

References (22)
  • 4
    • 0032402999 scopus 로고    scopus 로고
    • The fabrication and testing of optics for EUV projection lithography
    • Y. Vladirmirsky, ed., Proc. SPIE 3331
    • J. S. Taylor, G. E. Sommargren, D. W. Sweeney, and R. M. Hudyma, “The fabrication and testing of optics for EUV projection lithography,” in Emerging Lithographic Technologies II, Y. Vladirmirsky, ed., Proc. SPIE 3331, 580-590 (1998).
    • (1998) Emerging Lithographic Technologies II , pp. 580-590
    • Taylor, J.S.1    Sommargren, G.E.2    Sweeney, D.W.3    Hudyma, R.M.4
  • 7
    • 0346659062 scopus 로고
    • Multilayer x-ray mirrors: Interfacial roughness, scattering, and image quail ty
    • E. Spiller, D. Stearns, and M. Krumrey, “Multilayer x-ray mirrors: interfacial roughness, scattering, and image quail ty,” J. Appl. Phys. 74, 107-118 (1993).
    • (1993) J. Appl. Phys. , vol.74 , pp. 107-118
    • Spiller, E.1    Stearns, D.2    Krumrey, M.3
  • 8
    • 0027795351 scopus 로고
    • Multilayer mirror technology for soft-x-ray projection lithography
    • D. G. Stearns, R. S. Rosen, and S. P. Vernon, “Multilayer mirror technology for soft-x-ray projection lithography,” Appl. Opt. 32, 6952-6960 (1993).
    • (1993) Appl. Opt. , vol.32 , pp. 6952-6960
    • Stearns, D.G.1    Rosen, R.S.2    Vernon, S.P.3
  • 9
    • 0028421881 scopus 로고
    • Surface finish requirements for soft-x-ray mirrors
    • D. L. Windt, W. K. Waskiewicz, and J. E. Griffith, “Surface finish requirements for soft-x-ray mirrors,” Appl. Opt. 33, 2025-2031 (1994).
    • (1994) Appl. Opt. , vol.33 , pp. 2025-2031
    • Windt, D.L.1    Waskiewicz, W.K.2    Griffith, J.E.3
  • 10
    • 56249127529 scopus 로고    scopus 로고
    • Nonspecular scattering in a multilayer-coated imaging system
    • D. G. Stearns, D. P. Gaines, D. W. Sweeney, and E. M. Gul-likson, “Nonspecular scattering in a multilayer-coated imaging system,” J. Appl. Phys. 84, 1003-1028 (1998).
    • (1998) J. Appl. Phys. , vol.84 , pp. 1003-1028
    • Stearns, D.G.1    Gaines, D.P.2    Sweeney, D.W.3    Gul-Likson, E.M.4
  • 11
    • 85010118624 scopus 로고    scopus 로고
    • Scattering from normal incidence EUV optics
    • Y. Vladirmir-sky, ed., Proc. SPIE 3676
    • E. M. Gullikson, “Scattering from normal incidence EUV optics,” in Emerging Lithographic Technologies III, Y. Vladirmir-sky, ed., Proc. SPIE 3676, 72-80 (1999).
    • (1999) Emerging Lithographic Technologies III , pp. 72-80
    • Gullikson, E.M.1
  • 12
    • 0001662271 scopus 로고    scopus 로고
    • Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme ultraviolet lithography
    • P. B. Mirkarimi, S. Bajt, and M. Wall, “Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme ultraviolet lithography,” Appl. Opt. 39, 1617-1625 (2000).
    • (2000) Appl. Opt. , vol.39 , pp. 1617-1625
    • Mirkarimi, P.B.1    Bajt, S.2    Wall, M.3
  • 14
    • 5244231664 scopus 로고
    • Mechanical properties of SiO2 vs. SiO2-TiO2 bulk glasses and fibers
    • M. M. Broer, G. H. Siegel, R. T. Kersten, and H. Kawazoe, eds. (Materials Research Society, Pittsburgh, Pa
    • 2 bulk glasses and fibers,” in Optical Waveguide Materials, M. M. Broer, G. H. Siegel, R. T. Kersten, and H. Kawazoe, eds. (Materials Research Society, Pittsburgh, Pa., 1992), Vol. 244, pp. 67-84.
    • (1992) Optical Waveguide Materials , vol.244 , pp. 67-84
    • Gulati, S.T.1
  • 16
    • 0038644391 scopus 로고
    • Repair of soft x-ray optical elements by stripping and redeposition of Mo/Si reflective coatings
    • K. Early, D. L. Windt, W. K. Waskiewicz, O. R. Wood II, and D. M. Tennant, “Repair of soft x-ray optical elements by stripping and redeposition of Mo/Si reflective coatings,” J. Vac. Sci. Technol. B 11, 2926-2929 (1993).
    • (1993) J. Vac. Sci. Technol. , vol.B11 , pp. 2926-2929
    • Early, K.1    Windt, D.L.2    Waskiewicz, W.K.3    Wood, O.R.4    Tennant, D.M.5
  • 18
    • 0038305455 scopus 로고
    • Recovery of EUV lithography substrates
    • D. T. Atwood and F. Zernike, eds., of OSA Proceedings Series (Optical Society of America, Washington, D.C
    • S. P. Vernon and S. L. Baker, “Recovery of EUV lithography substrates,” in Extreme Ultraviolet Lithography, D. T. Atwood and F. Zernike, eds., Vol. 23 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1995), pp. 222-226.
    • (1995) Extreme Ultraviolet Lithography , vol.23 , pp. 222-226
    • Vernon, S.P.1    Baker, S.L.2
  • 19
    • 0033361671 scopus 로고    scopus 로고
    • Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography
    • C. A. MacDonald, K. A. Goldberg, J. R. Maldando, H. H. Chen-Mayer, and S. P. Vernon, eds., Proc. SPIE 3767
    • S. Bajt, R. D. Behymer, P. B. Mirkarimi, C. Montcalm, M. A. Wall, M. Wedowski, and J. A. Folta, “Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography,” in EUV, X-Ray, and Neutron Optics and Sources, C. A. MacDonald, K. A. Goldberg, J. R. Maldando, H. H. Chen-Mayer, and S. P. Vernon, eds., Proc. SPIE 3767, 259-270 (1999).
    • (1999) EUV, X-Ray, and Neutron Optics and Sources , pp. 259-270
    • Bajt, S.1    Behymer, R.D.2    Mirkarimi, P.B.3    Montcalm, C.4    Wall, M.A.5    Wedowski, M.6    Folta, J.A.7
  • 20
    • 0032665978 scopus 로고    scopus 로고
    • Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography
    • P. B. Mirkarimi, “Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography,” Opt. Eng. 38, 1246-1259 (1999).
    • (1999) Opt. Eng. , vol.38 , pp. 1246-1259
    • Mirkarimi, P.B.1
  • 21
    • 84953675274 scopus 로고
    • Fabrication of high-reflectance Mo-Si multilayer mirrors by planarmagnetron sputtering
    • D. G. Stearns, R. S. Rosen, and S. P. Vernon, “Fabrication of high-reflectance Mo-Si multilayer mirrors by planarmagnetron sputtering,” J. Vac. Sci. Technol. A 9, 2662-2669 (1991).
    • (1991) J. Vac. Sci. Technol. A , vol.9 , pp. 2662-2669
    • Stearns, D.G.1    Rosen, R.S.2    Vernon, S.P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.