-
1
-
-
0035166250
-
An updated data compendium of enhanced low dose rate sensitive (ELDRS) bipolar linear circuits
-
Vancouver, BC, Canada
-
R. L. Pease, L. McClure, A. H. Johnson, J. Gorelick, T. L. Turflinger, M. Gehlhausen, J. Krieg, T. Carriere, and M. Shaneyfelt, "An updated data compendium of enhanced low dose rate sensitive (ELDRS) bipolar linear circuits," in 2001 IEEE Radiation Effects Data Workshop, Vancouver, BC, Canada, pp. 127-133.
-
(2001)
2001 IEEE Radiation Effects Data Workshop
, pp. 127-133
-
-
Pease, R.L.1
McClure, L.2
Johnson, A.H.3
Gorelick, J.4
Turflinger, T.L.5
Gehlhausen, M.6
Krieg, J.7
Carriere, T.8
Shaneyfelt, M.9
-
2
-
-
0021587257
-
Physical mechanisms contributing to device rebound
-
Dec.
-
J. R. Schwank, P. S. Winokur, P. J. McWhorter, F. W. Sexton, P. V. Dressendorfer, and D. C. Turpin, "Physical mechanisms contributing to device rebound," IEEE Trans. Nucl. Sci., vol. NS-31, pp. 1434-1438, Dec. 1984.
-
(1984)
IEEE Trans. Nucl. Sci.
, vol.NS-31
, pp. 1434-1438
-
-
Schwank, J.R.1
Winokur, P.S.2
McWhorter, P.J.3
Sexton, F.W.4
Dressendorfer, P.V.5
Turpin, D.C.6
-
3
-
-
0024891801
-
An improved total dose test for CMOS space electronics
-
Dec.
-
D. M. Fleetwood, P. S. Winokur, L. C. Riewe, and R. L. Pease, "An improved total dose test for CMOS space electronics," IEEE Trans. Nucl. Sci., vol. 36, pp. 1963-1970, Dec. 1989.
-
(1989)
IEEE Trans. Nucl. Sci.
, vol.36
, pp. 1963-1970
-
-
Fleetwood, D.M.1
Winokur, P.S.2
Riewe, L.C.3
Pease, R.L.4
-
4
-
-
0026390651
-
Response of advanced bipolar processes to ionizing radiation
-
Dec.
-
E. W. Enlow, R. L. Pease, W. E. Combs, R. D. Schrimpf, and R. N. Nowlin, "Response of advanced bipolar processes to ionizing radiation," IEEE Trans. Nucl. Sci., vol. 38, pp. 1342-1351, Dec. 1991.
-
(1991)
IEEE Trans. Nucl. Sci.
, vol.38
, pp. 1342-1351
-
-
Enlow, E.W.1
Pease, R.L.2
Combs, W.E.3
Schrimpf, R.D.4
Nowlin, R.N.5
-
5
-
-
0028714344
-
Physical mechanisms contributing to enhanced bipolar gain degradation at low dose rates
-
Dec.
-
D. M. Fleetwood, S. L. Kosier, R. N. Nowlin, R. D. Schrimpf, R. A. Reber, Jr., M. DeLaus, P. S. Winokur, A. Wei, W. E. Combs, and R. L. Pease, "Physical mechanisms contributing to enhanced bipolar gain degradation at low dose rates," IEEE Trans. Nucl. Sci., vol. 41, pp. 1871-1883, Dec. 1994.
-
(1994)
IEEE Trans. Nucl. Sci.
, vol.41
, pp. 1871-1883
-
-
Fleetwood, D.M.1
Kosier, S.L.2
Nowlin, R.N.3
Schrimpf, R.D.4
Reber R.A., Jr.5
DeLaus, M.6
Winokur, P.S.7
Wei, A.8
Combs, W.E.9
Pease, R.L.10
-
6
-
-
0032306166
-
Space charge limited degradation of bipolar oxides at low electric fields
-
Dec.
-
S. C. Witczak, R. C. Lacoe, D.C. Mayer, D. M. Fleetwood, R. D. Schrimpf, and K. F. Galloway, "Space charge limited degradation of bipolar oxides at low electric fields," IEEE Trans. Nucl. Sci., vol. 45, pp. 2339-2351, Dec. 1998.
-
(1998)
IEEE Trans. Nucl. Sci.
, vol.45
, pp. 2339-2351
-
-
Witczak, S.C.1
Lacoe, R.C.2
Mayer, D.C.3
Fleetwood, D.M.4
Schrimpf, R.D.5
Galloway, K.F.6
-
7
-
-
0030372722
-
Enhanced damage in bipolar devices at low dose rates: Effects at very low dose rates
-
Dec.
-
A. H. Johnston, C. I. Lee, and B. G. Rax, "Enhanced damage in bipolar devices at low dose rates: Effects at very low dose rates," IEEE Trans. Nucl. Sci., vol. 43, pp. 3049-3059, Dec. 1996.
-
(1996)
IEEE Trans. Nucl. Sci.
, vol.43
, pp. 3049-3059
-
-
Johnston, A.H.1
Lee, C.I.2
Rax, B.G.3
-
8
-
-
0034451416
-
Evaluation of accelerated total dose testing of linear bipolar circuits
-
Dec.
-
T. Carriere, R. Ecoffet, and P. Poirot, "Evaluation of accelerated total dose testing of linear bipolar circuits," IEEE Trans. Nucl. Sci., vol. 47, pp. 2350-2357, Dec. 2000.
-
(2000)
IEEE Trans. Nucl. Sci.
, vol.47
, pp. 2350-2357
-
-
Carriere, T.1
Ecoffet, R.2
Poirot, P.3
-
9
-
-
0030173038
-
Effects of reliability screens on charge trapping
-
June
-
M. R. Shaneyfelt, P. S. Winokur, D. M. Fleetwood, J. R. Schwank, and R. A. Reber, Jr., "Effects of reliability screens on charge trapping," IEEE Trans. Nucl. Sci., vol. 43, pp. 865-872, June 1996.
-
(1996)
IEEE Trans. Nucl. Sci.
, vol.43
, pp. 865-872
-
-
Shaneyfelt, M.R.1
Winokur, P.S.2
Fleetwood, D.M.3
Schwank, J.R.4
Reber R.A., Jr.5
-
10
-
-
0034451107
-
Thermal-stress effects on enhanced low dose rate sensitivity in linear bipolar circuits
-
Dec.
-
M. R. Shaneyfelt, J. R. Schwank, S. C. Witczak, D. M. Fleetwood, R. L. Pease, P. S. Winokur, L. C. Riewe, and G. L. Hash, "Thermal-stress effects on enhanced low dose rate sensitivity in linear bipolar circuits," IEEE Trans. Nucl. Sci., vol. 47, pp. 2539-2545, Dec. 2000.
-
(2000)
IEEE Trans. Nucl. Sci.
, vol.47
, pp. 2539-2545
-
-
Shaneyfelt, M.R.1
Schwank, J.R.2
Witczak, S.C.3
Fleetwood, D.M.4
Pease, R.L.5
Winokur, P.S.6
Riewe, L.C.7
Hash, G.L.8
-
11
-
-
0031355641
-
Impact of aging on radiation hardness
-
Dec.
-
M. R. Shaneyfelt, P. S. Winokur, D. M. Fleetwood, G. L. Hash, J. R. Schwank, F. W. Sexton, and R. L. Pease, "Impact of aging on radiation hardness," IEEE Trans. Nucl. Sci., vol. 44, pp. 2040-2047, Dec. 1997.
-
(1997)
IEEE Trans. Nucl. Sci.
, vol.44
, pp. 2040-2047
-
-
Shaneyfelt, M.R.1
Winokur, P.S.2
Fleetwood, D.M.3
Hash, G.L.4
Schwank, J.R.5
Sexton, F.W.6
Pease, R.L.7
-
12
-
-
0035723330
-
Aging and baking effects on the radiation hardness of MOS capacitors
-
Dec.
-
A. P. Karmarkar, B. K. Choi, R. D. Schrimpf, and D. M. Fleetwood, "Aging and baking effects on the radiation hardness of MOS capacitors," IEEE Trans. Nucl. Sci., vol. 48, pp. 2158-2163, Dec. 2001.
-
(2001)
IEEE Trans. Nucl. Sci.
, vol.48
, pp. 2158-2163
-
-
Karmarkar, A.P.1
Choi, B.K.2
Schrimpf, R.D.3
Fleetwood, D.M.4
-
13
-
-
0033324766
-
Hardness assurance implications of bimodal total dose response in a bipolar linear voltage comparator
-
Dec.
-
J. Krieg, T. Turflinger, J. Titus, P. Cole, P. Baker, M. Gehlhausen, D. Emily, L. Yang, R. L. Pease, H. Barnaby, R. Schrimpf, and M. C. Maher, "Hardness assurance implications of bimodal total dose response in a bipolar linear voltage comparator," IEEE Trans. Nucl. Sci., vol. 46, pp. 1627-1632, Dec. 1999.
-
(1999)
IEEE Trans. Nucl. Sci.
, vol.46
, pp. 1627-1632
-
-
Krieg, J.1
Turflinger, T.2
Titus, J.3
Cole, P.4
Baker, P.5
Gehlhausen, M.6
Emily, D.7
Yang, L.8
Pease, R.L.9
Barnaby, H.10
Schrimpf, R.11
Maher, M.C.12
-
14
-
-
0002447862
-
Elastic recoil detection: ERD
-
J. R. Tesmer and M. Nastasi, Eds. Pittsburgh, PA: Mat. Res. Soc.
-
J. C. Barbour and B. L. Doyle, "Elastic recoil detection: ERD," in Handbook of Modern Ion Beam Materials Analysis, J. R. Tesmer and M. Nastasi, Eds. Pittsburgh, PA: Mat. Res. Soc., 1995, pp. 83-137.
-
(1995)
Handbook of Modern Ion Beam Materials Analysis
, pp. 83-137
-
-
Barbour, J.C.1
Doyle, B.L.2
-
15
-
-
0025229137
-
A curved detection slit to improve ERD energy and depth resolution
-
D. K. Brice and B. L. Doyle, "A curved detection slit to improve ERD energy and depth resolution," Nucl. Instrum. Methods Phys. Res. B, Beam Interact. Mater At., vol. 45, no. 1-4, pp. 265-269, 1990.
-
(1990)
Nucl. Instrum. Methods Phys. Res. B, Beam Interact. Mater At.
, vol.45
, Issue.1-4
, pp. 265-269
-
-
Brice, D.K.1
Doyle, B.L.2
-
16
-
-
0030361136
-
Radiation effects at low electric fields in thermal, SIMOX, and bipolar-base oxides
-
Dec.
-
D. M. Fleetwood, L. C. Riewe, J. R. Schwank, S. C. Witczak, and R. D. Schrimpf, "Radiation effects at low electric fields in thermal, SIMOX, and bipolar-base oxides," IEEE Trans. Nucl. Sci., vol. 43, pp. 2537-2546, Dec. 1996.
-
(1996)
IEEE Trans. Nucl. Sci.
, vol.43
, pp. 2537-2546
-
-
Fleetwood, D.M.1
Riewe, L.C.2
Schwank, J.R.3
Witczak, S.C.4
Schrimpf, R.D.5
-
17
-
-
0036540124
-
Effects of hydrogen transport and reactions on microelectronics radiation response and reliability
-
D. M. Fleetwood, "Effects of hydrogen transport and reactions on microelectronics radiation response and reliability," Microelectron. Reliab., vol. 42, pp. 523-541, 2002.
-
(2002)
Microelectron. Reliab.
, vol.42
, pp. 523-541
-
-
Fleetwood, D.M.1
-
18
-
-
0019300412
-
Threshold voltage instability in MOSFETs due to channel hot hole emission
-
R. B. Fair and R. C. Sun, "Threshold voltage instability in MOSFETs due to channel hot hole emission," in Proc. IEDM Tech. Dig., 1980, pp. 746-749.
-
(1980)
Proc. IEDM Tech. Dig.
, pp. 746-749
-
-
Fair, R.B.1
Sun, R.C.2
-
19
-
-
0018531345
-
Properties of plasma-deposited-silicon nitride
-
Oct.
-
H. J. Stein, V. A. Wells, and R. E. Hampy, "Properties of plasma-deposited-silicon nitride," J. Electrochem. Soc., vol. 126, pp. 1750-1754, Oct. 1979.
-
(1979)
J. Electrochem. Soc.
, vol.126
, pp. 1750-1754
-
-
Stein, H.J.1
Wells, V.A.2
Hampy, R.E.3
-
20
-
-
0019299499
-
Effects of silicon nitride encapsulation on MOS device stability
-
Las Vegas, NV, Apr.
-
R. C. Sun, J. T. Clemens, and J. T. Nelson, "Effects of silicon nitride encapsulation on MOS device stability," in Proc. 18th Int. Reliabilty Physics Symp., Las Vegas, NV, Apr. 1980, pp. 244-251.
-
(1980)
Proc. 18th Int. Reliabilty Physics Symp.
, pp. 244-251
-
-
Sun, R.C.1
Clemens, J.T.2
Nelson, J.T.3
-
22
-
-
0034506936
-
Continuing radiation evaluation of commercial-off-the-shelf devices for space application
-
Reno, NV
-
J. L. Gorelick and S. S. McClure, "Continuing radiation evaluation of commercial-off-the-shelf devices for space application," in Proc. IEEE Radiation Effects Data Workshop, Reno, NV, pp. 6-10.
-
Proc. IEEE Radiation Effects Data Workshop
, pp. 6-10
-
-
Gorelick, J.L.1
McClure, S.S.2
-
23
-
-
0036956332
-
Total dose hardening of a bipolar voltage comparator
-
Dec.
-
R. L. Pease, M. C. Maher, M. R. Shaneyfelt, M. Savage, P. Baker, J. Krieg, and T. TurflingerS, "Total dose hardening of a bipolar voltage comparator," IEEE Trans. Nucl. Sci., vol. 49, pp. 3180-3184, Dec. 2002.
-
(2002)
IEEE Trans. Nucl. Sci.
, vol.49
, pp. 3180-3184
-
-
Pease, R.L.1
Maher, M.C.2
Shaneyfelt, M.R.3
Savage, M.4
Baker, P.5
Krieg, J.6
TurflingerS, T.7
-
24
-
-
0033350984
-
Enhanced low dose rate sensitivity (ELDRS) of linear circuits in a space environment
-
Dec.
-
J. L. Titus, D. Emily, J. F. Krieg, T. Turflinger, R. L. Pease, and A. Campbell, "Enhanced low dose rate sensitivity (ELDRS) of linear circuits in a space environment," IEEE Trans. Nucl. Sci., vol. 46, pp. 1608-1615, Dec. 1999.
-
(1999)
IEEE Trans. Nucl. Sci.
, vol.46
, pp. 1608-1615
-
-
Titus, J.L.1
Emily, D.2
Krieg, J.F.3
Turflinger, T.4
Pease, R.L.5
Campbell, A.6
-
25
-
-
0035173716
-
Manufacturer variability of enhanced low dose rate sensitivity (ELDRS) in a voltage comparator
-
Vancouver, BC, Canada
-
J. Krieg, T. Turflinger, and R. Pease, "Manufacturer variability of enhanced low dose rate sensitivity (ELDRS) in a voltage comparator," in Proc. Radiation Effects Data Workshop, Vancouver, BC, Canada, pp. 167-171.
-
Proc. Radiation Effects Data Workshop
, pp. 167-171
-
-
Krieg, J.1
Turflinger, T.2
Pease, R.3
-
27
-
-
0021601862
-
Dependence of x-ray generation of interface traps on gate metal induced interfacial stress in MOS structures
-
Dec.
-
V. Zekeriya and T. P. Ma, "Dependence of x-ray generation of interface traps on gate metal induced interfacial stress in MOS structures," IEEE Trans. Nucl. Sci., vol. NS-31, pp. 1261-1266, Dec. 1984.
-
(1984)
IEEE Trans. Nucl. Sci.
, vol.NS-31
, pp. 1261-1266
-
-
Zekeriya, V.1
Ma, T.P.2
-
28
-
-
0022916325
-
Mechanical stress dependence of radiation effects in MOS structures
-
Dec.
-
K. Kasama, F. Toyokawa, M. Tsukiji, M. Tsukjii, M. Sakamoto, and K. Kobayashi, "Mechanical stress dependence of radiation effects in MOS structures," IEEE Trans. Nucl. Sci., vol. NS-33, pp. 1210-1215, Dec. 1986.
-
(1986)
IEEE Trans. Nucl. Sci.
, vol.NS-33
, pp. 1210-1215
-
-
Kasama, K.1
Toyokawa, F.2
Tsukiji, M.3
Tsukjii, M.4
Sakamoto, M.5
Kobayashi, K.6
-
29
-
-
0000562210
-
Comparative study of the elastic properties of silicate glass films grown by plasma enhanced chemical vapor deposition
-
Nov./Dec.
-
G. Carlotti, L. Doucet, and M. Dupeux, "Comparative study of the elastic properties of silicate glass films grown by plasma enhanced chemical vapor deposition," J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., vol. 14, pp. 3460-3465, Nov./Dec. 1996.
-
(1996)
J. Vac. Sci. Technol. B, Microelectron. Process. Phenom.
, vol.14
, pp. 3460-3465
-
-
Carlotti, G.1
Doucet, L.2
Dupeux, M.3
-
30
-
-
0002712235
-
Stress in PSG and nitride films as related to film properties and annealing
-
May 1
-
T. H. Wu and R. S. Rosler, "Stress in PSG and nitride films as related to film properties and annealing," Solid-State Technol., vol. 35, pp. 65-72, May 1992.
-
(1992)
Solid-State Technol.
, vol.35
, pp. 65-72
-
-
Wu, T.H.1
Rosler, R.S.2
-
31
-
-
0018585988
-
Degradation of radiation hardness in CMOS integrated circuits passivated with plasma-deposited silicon nitride
-
Dec.
-
R. E. Anderson, "Degradation of radiation hardness in CMOS integrated circuits passivated with plasma-deposited silicon nitride," IEEE Trans. Nucl. Sci., vol. NS-26, pp. 5180-5184, Dec. 1979.
-
(1979)
IEEE Trans. Nucl. Sci.
, vol.NS-26
, pp. 5180-5184
-
-
Anderson, R.E.1
-
32
-
-
0029547147
-
Plastic packaging and bum-in effects on ionizing dose response in CMOS microcircuits
-
Dec.
-
S. Clark, J. Bings, M. Maher, M. Williams, D. Alexander, and R. Pease, "Plastic packaging and bum-in effects on ionizing dose response in CMOS microcircuits," IEEE Trans. Nucl. Sci., vol. 42, pp. 1607-1614, Dec. 1995.
-
(1995)
IEEE Trans. Nucl. Sci.
, vol.42
, pp. 1607-1614
-
-
Clark, S.1
Bings, J.2
Maher, M.3
Williams, M.4
Alexander, D.5
Pease, R.6
-
33
-
-
0020498208
-
The quality of die-attachment and its relationship to stresses and vertical die-cracking
-
Orlando, FL, May 16-18
-
C. G. M. van Kessel, S. A. Gee, and J. J. Murphy, "The quality of die-attachment and its relationship to stresses and vertical die-cracking," in Proc. 33rd Electronic Components Conf., Orlando, FL, May 16-18, 1983, pp. 237-244.
-
(1983)
Proc. 33rd Electronic Components Conf.
, pp. 237-244
-
-
Van Kessel, C.G.M.1
Gee, S.A.2
Murphy, J.J.3
-
34
-
-
0033351820
-
Identification of degradation mechanisms in a bipolar linear voltage comparator through correlation of transistor and circuit response
-
Dec.
-
H. J. Barnaby, R. D. Schrimpf, R. L. Pease, P. Cole, T. Turflinger, J. Krieg, J. Titus, D. Emily, M. Gehlhausen, S. C. Witczak, M. C. Maher, and D. Van Nort, "Identification of degradation mechanisms in a bipolar linear voltage comparator through correlation of transistor and circuit response," IEEE Trans. Nucl. Sci., vol. 46, pp. 1666-1673, Dec. 1999.
-
(1999)
IEEE Trans. Nucl. Sci.
, vol.46
, pp. 1666-1673
-
-
Barnaby, H.J.1
Schrimpf, R.D.2
Pease, R.L.3
Cole, P.4
Turflinger, T.5
Krieg, J.6
Titus, J.7
Emily, D.8
Gehlhausen, M.9
Witczak, S.C.10
Maher, M.C.11
Van Nort, D.12
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