Comparative study of the elastic properties of silicate glass films grown by plasma enhanced chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3460-3464

  Carlotti, G ^a   Doucet, L ^b,c   Dupeux, M ^c  

^a UNIVERSITY OF PERUGIA   (Italy)

^b STMICROELECTRONICS   (Italy)

^c UNIV GRENOBLE ALPES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000562210     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588780     Document Type: Article

References (24)

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