Spectroscopic ellipsometry for process applications

Solid State Technology

Volumn 39, Issue 10, 1996, Pages 157-167

  Hilfiker, James N ^a,b   Synowicki, Ron A ^a,b,c  

^a J A WOOLLAM CO INC   (United States)

^b UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^c Analytical Services Laboratory   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; MULTILAYERS; SPECTROSCOPIC ANALYSIS; THIN FILMS;

OPTICAL CONSTANTS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030251532     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (3)

1. R.M.A. Azzam, N.M. Bashara, Ellipsometry and Polarized Light, North-Holland Publishing, New York, 1983.
2. W.A. McGahan, J.A. Woollam, "Ellipsometric Characterization of Thin Oxides on Silicon," Semiconductor Characterization: Present Status and Future Needs, AIP Press, Woodbury, NY, 1996.
3. S. Pittal et al., "Electron Cyclotron Resonance (ECR) Semiconductor Etching Process Control by Ellipsometry," Final Scientific and Technical Report, J.A. Woollam Co., Inc., Sponsored by Dept. of the Air Force Wright Laboratory (AFMC), October 23, 1995.