Real time control of the growth of silicon alloy multilayers by multiwavelength ellipsometry

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 46-50

  Kildemo, M ^a,b   Deniau, S ^a   Bulkin, P ^a   Drevillon B ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b NORWEGIAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Norway)

Author keywords

Ellipsometry; Multilayers; Silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; FEEDBACK; FILM GROWTH; MULTILAYERS; PHASE MODULATION; REAL TIME SYSTEMS; REFRACTIVE INDEX; SILICA; SILICON ALLOYS; TRANSPARENCY;

FEEDBACK METHOD; MULTIWAVELENGTH PHASE MODULATED ELLIPSOMETRY (PME);

OPTICAL FILMS;

EID: 0347611325     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09175-4     Document Type: Article

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