Adapted wavelength methods for in situ ellipsometry

Thin Solid Films

Volumn 313-314, Issue , 1998, Pages 479-483

  Callard, S ^a   Gagnaire, A ^a   Besland, M P ^a   Joseph, J ^a  

^a ECOLE CENTRALE DE LYON   (France)

Author keywords

Control; In situ ellipsometry; Temperature; Thickness; Wavelength

Indexed keywords

MIRRORS; MULTILAYERS; TEMPERATURE MEASUREMENT; THERMAL EFFECTS; THICKNESS MEASUREMENT;

ADAPTED WAVELENGTH ELLIPSOMETRY;

ELLIPSOMETRY;

EID: 0031999916     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00868-7     Document Type: Article

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