CVD of ZrO2 using Zrl4 as metal precursor

Journal De Physique. IV : JP

Volumn 9 I, Issue 8, 1999, Pages

  Forsgren, K ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; ELECTRIC PROPERTIES; EVAPORATION; OXYGEN; SILICON; TEMPERATURE; THERMODYNAMIC STABILITY; ZIRCONIUM COMPOUNDS;

HALIDE; ZIRCONIUM TETRAIODIDE;

ZIRCONIA;

EID: 0342520856     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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