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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 2, 2001, Pages 515-523

Microcrystalline silicon by plasma enhanced chemical vapor deposition from silicon tetrafluoride

(3) Cicala, G a Capezzuto, P a Bruno, G a

a UNIVERSITY OF BARI (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; AMORPHOUS SILICON; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; FILM GROWTH; HELIUM; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SILICON COMPOUNDS;

SILICON TETRAFLUORIDE;

AMORPHOUS FILMS;

EID: 0035272607 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1351004 Document Type: Article

Times cited : (12)

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