Plasma deposition and characterization of photoluminescent fluorinated nanocrystalline silicon films

Journal of Applied Physics

Volumn 80, Issue 11, 1996, Pages 6564-6566

  Cicala, G ^a   Capezzuto, P ^a   Bruno, G ^a   Schiavulli, L ^a   Perna, G ^a   Capozzi, V ^a  

^a UNIVERSITY OF BARI   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000998727     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363641     Document Type: Article

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