Low temperature deposition of polycrystalline silicon thin films prepared by hot wire cell method

Materials Research Society Symposium - Proceedings

Volumn 536, Issue , 1999, Pages 487-492

  Ichikawa, M ^a   Takeshita, J ^a   Yamada, A ^a   Konagai, M ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; FILM GROWTH; FILM PREPARATION; GRAIN SIZE AND SHAPE; HYDROGEN; LOW TEMPERATURE OPERATIONS; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; X RAY ANALYSIS;

HOW WIRE CELL METHOD; HYDROGEN DILUTION; LOW TEMPERATURE DEPOSITION; POLYCRYSTALLINE SILICON THIN FILMS;

THIN FILMS;

EID: 0032591477     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (8)

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