Deposition of microcrystalline silicon in an integrated distributed electron cyclotron resonance PECVD reactor

Thin Solid Films

Volumn 337, Issue 1-2, 1999, Pages 37-40

  Bulkin, P ^a   Hofrichter, A ^a   Brenot, R ^a   Drevillon B ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

Integrated distributed electron cyclotron resonance; Microcrystalline silicon; Plasma enhanced chemical vapour deposition

Indexed keywords

EID: 0001801010     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01376-5     Document Type: Article

References (9)

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