Carrier transport, structure and orientation in polycrystalline silicon on glass

Thin Solid Films

Volumn 337, Issue 1-2, 1999, Pages 45-50

  Nakahata, K ^a   Miida, A ^a   Kamiya, T ^a   Fortmann, C M ^a   Shimizu, I ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Plasma enhanced chemical vapor deposition; Polycrystalline silicon on glass; X ray diffraction

Indexed keywords

EID: 0002309326     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01182-1     Document Type: Article

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