Latent image characterization of postexposure bake process in chemically amplified resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2545-2549

  Ocola, L E ^a,b   Cerrina, F ^a   May, Tim ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003649505     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589682     Document Type: Article

References (12)

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