Resist application effects on chemically amplified resist response

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4239-4245

  Dentinger, Paul M ^a   Nelson, Carla M ^a   Rhyner, Steven J ^a   Taylor, James W ^a   Fedynyshyn, Theodore H ^b   Cronin, Michael F ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000563550     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588583     Document Type: Article

References (23)

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