Atomic layer deposition of SiO2 and TiO2 in alumina tubular membranes: Pore reduction and effect of surface species on gas transport

Langmuir

Volumn 16, Issue 19, 2000, Pages 7435-7444

  Cameron, M A ^a,c   Gartland, I P ^b   Smith, J A ^a   Diaz, S F ^a   George, S M ^a  

^a UNIVERSITY OF COLORADO   (United States)

^b Eltron Research & Development Inc   (United States)

^c UNIVERSITY OF WASHINGTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS; MEMBRANES; SILICA; TITANIUM DIOXIDE; VAN DER WAALS FORCES; WATER;

ALUMINA TUBULAR MEMBRANES;

ALUMINA;

EID: 0034270209     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la9916981     Document Type: Article

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