Effects of O2 rapid thermal annealing on the microstructural properties and reliability of RF-sputtered Ta2O5 films

IEEE Transactions on Dielectrics and Electrical Insulation

Volumn 7, Issue 3, 2000, Pages 316-321

  Wang, Ching Wu ^a   Lin, Ren De ^a   Chen, Shih Fang ^a   Lin, Wen Kuan ^a  

^a I SHOU UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTAL MICROSTRUCTURE; DIFFUSION IN SOLIDS; GRAIN BOUNDARIES; HOLE TRAPS; LEAKAGE CURRENTS; OXYGEN; POINT DEFECTS; RAPID THERMAL ANNEALING; RELIABILITY; SPUTTER DEPOSITION; TANTALUM COMPOUNDS;

TANTALUM PENTOXIDE;

DIELECTRIC FILMS;

EID: 0033691112     PISSN: 10709878     EISSN: None     Source Type: Journal    
DOI: 10.1109/94.848906     Document Type: Article

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