The migration of fluoride ions in growing anodic oxide films on tantalum

Journal of the Electrochemical Society

Volumn 144, Issue 2, 1997, Pages 418-423

  Shimizu, K ^a   Kobayashi, K ^a   Thompson, G E ^b,c   Skeldon, P ^b,c   Wood, G C ^b,c  

^a KEIO UNIVERSITY   (Japan)

^b UNIVERSITY OF MANCHESTER   (United Kingdom)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROLYTES; FILM GROWTH; OXIDES; SECONDARY ION MASS SPECTROMETRY; TANTALUM; TRANSPORT PROPERTIES;

ANODIC OXIDES; FLUORIDE IONS; MIGRATION;

IONS;

EID: 0031075794     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837425     Document Type: Article

References (16)

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